IEST-RP-CC031.2: Method for Characterizing Outgassed Organic Compounds from Cleanroom Materials and Components is relevant to industries that may experience adverse production yields as a result of gaseous organic contamination, also known as volatile organic compounds (VOCs) and semivolatile organic compounds (SVOCs). In the semiconductor industry, the deposition of outgassed compounds on hardware, products, and wafer surfaces is recognized as a source of processing problems and hardware failures. In aerospace, the presence of molecular contamination can significantly degrade spacecraft performance goals and hasten end-of-life projections.
This RP provides both a semiquantitative determination and a qualitative identification of a large range of compounds. The method is designed to screen primarily cleanroom materials but can also be applied to materials used in other controlled environments for identification of outgassed compounds detectable by dynamic headspace gas chromatography-mass spectrometry (GC-MS).
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